Browsing by Author "Gustafsson, T."

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Improved film growth and flatband voltage control of ALD HfO2 and Hf-Al-O with n+ poly-si gates using chemical oxides and optimized post-annealing

Wilk, G. D.
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Green, Martin
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M.-Y., Ho
;
Busch, B. W.
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Sorsch, T. W.
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Klemens, F. P.
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Brijs, Bert
Proceedings paper
2002, Symposium on VLSI Technology: Digest of Technical Papers, 11/06/2002, p.88-9
Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

Tsai, Wilman
;
Carter, Richard
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Nohira, Hiroshi
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Caymax, Matty
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Conard, Thierry
;
Cosnier, Vincent
Journal article
2003, Microelectronic Engineering, (65) 3, p.259-272