Browsing by Author "Halliyal, A."
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Publication Analysis of high voltage TDDB measurements on Ta2O5/SiO2 stack
Proceedings paper1999, International Electron Devices Meeting. Technical digest; December 1999; Washington, D.C., p.327-330Publication Electrical properties of metal-insulator-semiconductor devices with high permittivity gate dielectric layers
Oral presentation2000, Semicon EuropePublication Electrical properties of thin SiON/Ta2O5 gate dielectric stacks
; ; ; ; ;Jeon, J. S. ;Halliyal, A.Ogle, B.Journal article1999, J. Appl. Phys., (86) 11, p.6462-6467Publication Soft breakdown in very thin Ta2 O5 gate dielectric layers
Journal article2000, Solid-State Electronics, (44) 3, p.521-525