Browsing by Author "Han, Jeong Hwan"
Now showing 1 - 5 of 5
- Results per page
- Sort Options
Publication Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
Journal article2013-07, Journal of Materials Chemistry C, (1) 37, p.5981-5989Publication Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes
Publication Ozone-based atomic layer deposition of Gd2O3 from tris(isopropyl-cyclopentadienyl) gadolinium: growth characteristics and surface chemistry
Journal article2015-12, Chemical Vapor Deposition, (21) 10_12, p.352-359Publication Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)3, Gd(iPrCp)3, and H2O
Journal article2014, Chemistry of Materials, (26) 3, p.1404-1412