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Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
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1997 since deposited on 2021-10-21
Acq. date: 2025-12-12
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1997 since deposited on 2021-10-21
Acq. date: 2025-12-12
Citations