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Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
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2003 since deposited on 2021-10-21
5last month
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Acq. date: 2026-02-15
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Statistics
Views
2003 since deposited on 2021-10-21
5last month
1last week
Acq. date: 2026-02-15
Citations