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Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
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2008 since deposited on 2021-10-21
5last month
Acq. date: 2026-03-16
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Statistics
Views
2008 since deposited on 2021-10-21
5last month
Acq. date: 2026-03-16
Citations