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Browsing by Author "Hapli, John"

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    Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

    Lucas, Kevin
    ;
    Cork, Christopher M.
    ;
    Miloslavsky, Alexander
    ;
    Luk-Pat, Gerard
    ;
    Barnes, Levi D.
    Journal article
    2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 3, p.33002
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    Interactions of double patterning technology with wafer processing, OPC and design flows

    Lucas, Kevin
    ;
    Cork, Chris
    ;
    Miloslavsky, Alex
    ;
    Luk-Pat, Gerry
    ;
    Barnes, Levi
    ;
    Hapli, John
    Proceedings paper
    2008, Optical Microlithography XXI, 24/02/2008, p.692403
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    Physical design and mask synthesis considerations for DPT

    Lucas, Kevin
    ;
    Cork, Chris
    ;
    Hapli, John
    ;
    Miloslavsky, Alex
    ;
    Wiaux, Vincent  
    ;
    Verhaegen, Staf
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    Physical design and mask synthesis considerations for DPT

    Lucas, Kevin
    ;
    Cork, Chris
    ;
    Hapli, John
    ;
    Miloslavsky, Alex
    ;
    Wiaux, Vincent  
    ;
    Verhaegen, Staf
    Proceedings paper
    2008, SEMATECH Litho Forum, 13/05/2008

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