Browsing by Author "Hapli, John"
Now showing 1 - 4 of 4
- Results Per Page
- Sort Options
Publication Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
;Lucas, Kevin ;Cork, Christopher M. ;Miloslavsky, Alexander ;Luk-Pat, GerardBarnes, Levi D.Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 3, p.33002Publication Interactions of double patterning technology with wafer processing, OPC and design flows
;Lucas, Kevin ;Cork, Chris ;Miloslavsky, Alex ;Luk-Pat, Gerry ;Barnes, LeviHapli, JohnProceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.692403Publication Physical design and mask synthesis considerations for DPT
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Physical design and mask synthesis considerations for DPT
Proceedings paper2008, SEMATECH Litho Forum, 13/05/2008