Browsing by Author "Huang, E."

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Characteristics of low-k and ultralow-k PECVD deposited SiCOH films

Grill, A.
;
Patel, V.
;
Rodbell, K.P.
;
Huang, E.
;
Christiansen, S.
;
Baklanov, Mikhaïl
Proceedings paper
2002, Silicon Materials - Processing, Characterization, and Reliability, 1/04/2002, p.569-574
Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study

Grill, A.
;
Patel, V.
;
Rodbell, K.P.
;
Huang, E.
;
Baklanov, Mikhaïl
;
Moguilnikov, Konstantin
Journal article
2003, Journal of Applied Physics, (94) 5, p.3427-3435