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Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
Publication:
Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
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Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Grill, A.
;
Patel, V.
;
Rodbell, K.P.
;
Huang, E.
;
Christiansen, S.
;
Baklanov, Mikhaïl
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1944
since deposited on 2021-10-14
2
last month
Acq. date: 2025-12-12
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Metrics
Views
1944
since deposited on 2021-10-14
2
last month
Acq. date: 2025-12-12
Citations