Publication:
Characteristics of low-k and ultralow-k PECVD deposited SiCOH films
Date
| dc.contributor.author | Grill, A. | |
| dc.contributor.author | Patel, V. | |
| dc.contributor.author | Rodbell, K.P. | |
| dc.contributor.author | Huang, E. | |
| dc.contributor.author | Christiansen, S. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.date.accessioned | 2021-10-14T21:43:57Z | |
| dc.date.available | 2021-10-14T21:43:57Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6368 | |
| dc.source.beginpage | 569 | |
| dc.source.conference | Silicon Materials - Processing, Characterization, and Reliability | |
| dc.source.conferencedate | 1/04/2002 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.source.endpage | 574 | |
| dc.title | Characteristics of low-k and ultralow-k PECVD deposited SiCOH films | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |