Browsing by Author "Hwang, Soobin"
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Publication Curvilinear Standard Cell Design for Semiconductor Manufacturing
Journal article2024, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, (37) 2, p.152-159Publication Machine learning based recursive partitioning for simplifying OPC model building complexity
Proceedings paper2021, Conference on Design-Process-Technology Co-optimization XV, FEB 22-26, 2021, p.116140OPublication Manufacturing-friendly curvilinear standard cell design
; ; ; ; Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 1295405Publication Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 129540X