Browsing by Author "Hwang, Soobin"
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Publication Curvilinear Standard Cell Design for Semiconductor Manufacturing
Journal article2024, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, (37) 2, p.152-159Publication Enhancement of DOF through RET and mask manufacturability in high-NA EUV
Proceedings paper2025, 2025 Conference on DTCO and Computational Patterning, 2025-04-22, p.1-9Publication EUV DRAM Patterning Historic Overview and Future Assumption
Proceedings paper2025, 2025 Conference on DTCO and Computational Patterning, 2025-04-25, p.134250V-1-134250V-13Publication High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation
Publication Logic and memory patterning breakthrough using High-NA lithography
Proceedings paper2024, 2024 Conference on Photomask Technology, 2024-09-29, p.1321604Publication Machine learning based recursive partitioning for simplifying OPC model building complexity
Proceedings paper2021, Conference on Design-Process-Technology Co-optimization XV, FEB 22-26, 2021, p.116140OPublication Manufacturing-friendly curvilinear standard cell design
; ; ; ; Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 1295405Publication OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask
Proceedings paper2025, 2025 Conference on DTCO and Computational Patterning, 2025-04-22, p.134250Y-1-134250Y-11Publication Parametric curve-based representation of piecewise linear masks
Journal article2025, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (24) 4, p.044401Publication Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 129540X