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Browsing by Author "Hwang, cheol seong"

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    Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate

    Park, Tae Joo
    ;
    Cho, Moon Ju
    ;
    Jung, Hyung-Suk
    ;
    Hwang, cheol seong
    Book chapter
    2012-08
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    Front end of the line process

    Han, Jeong Hwan
    ;
    Cho, Moon Ju
    ;
    Delabie, Annelies  
    ;
    Park, Tae Joo
    ;
    Hwang, cheol seong
    Book chapter
    2014
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    Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes

    Han, Jeong Hwan
    ;
    Lee, Sang Woon
    ;
    Choi, Byung Joon
    ;
    Eom, Taeyong
    ;
    Kim, Seong Keun
    ;
    Song, Seul Ji
    Journal article
    2013, Coordination Chemistry Reviews, (257) 23_24, p.3154-3176
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    Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers

    Cho, Moon Ju
    ;
    Degraeve, Robin  
    ;
    Pourtois, Geoffrey  
    ;
    Delabie, Annelies  
    ;
    Ragnarsson, Lars-Ake  
    Journal article
    2007-04, IEEE Trans. Electron Devices, (54) 4, p.752-758

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