Browsing by Author "Hwang, cheol seong"
Now showing 1 - 4 of 4
- Results per page
- Sort Options
Publication Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
;Park, Tae Joo ;Cho, Moon Ju ;Jung, Hyung-SukHwang, cheol seongBook chapter2012-08Publication Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes
;Han, Jeong Hwan ;Lee, Sang Woon ;Choi, Byung Joon ;Eom, Taeyong ;Kim, Seong KeunSong, Seul JiJournal article2013, Coordination Chemistry Reviews, (257) 23_24, p.3154-3176Publication Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers
Journal article2007-04, IEEE Trans. Electron Devices, (54) 4, p.752-758