Browsing by Author "Ingolfsson, Oddur"
Now showing 1 - 3 of 3
- Results per page
- Sort Options
Publication Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Journal article2021, PHYSICAL CHEMISTRY CHEMICAL PHYSICS, (23) 15, p.9228-9234Publication Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Journal article2021, ACS APPLIED POLYMER MATERIALS, (3) 4, p.1964-1972Publication Pathways to high-performance extreme ultra-violet lithography resists: Dissociative electron attachment to pentafluoro-phenyl triflate
Journal article2025, ISCIENCE, (28) 12, p.28