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Browsing by Author "Ingolfsson, Oddur"

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    Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

    Rathore, Ashish  
    ;
    Cipriani, Maicol
    ;
    Huang, Ching-Chung
    ;
    Amiaud, Lionel
    ;
    Dablemont, Celine
    Journal article
    2021, PHYSICAL CHEMISTRY CHEMICAL PHYSICS, (23) 15, p.9228-9234
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    Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

    Rathore, Ashish  
    ;
    Pollentier, Ivan  
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    Cipriani, Maicol
    ;
    Singh, Harpreet
    ;
    De Simone, Danilo  
    Journal article
    2021, ACS APPLIED POLYMER MATERIALS, (3) 4, p.1964-1972
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    Pathways to high-performance extreme ultra-violet lithography resists: Dissociative electron attachment to pentafluoro-phenyl triflate

    Mendes, Monica
    ;
    Tafrishi, Reza
    ;
    Guerra, Pedro
    ;
    Holzmeier, Fabian  
    ;
    Ingolfsson, Oddur  
    Journal article
    2025, ISCIENCE, (28) 12, p.28

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