Publication:
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Loading...
Journal
Abstract
Description
Metrics
Views
1345 since deposited on 2021-11-02
2last month
1last week
Acq. date: 2026-01-05
Citations
Metrics
Views
1345 since deposited on 2021-11-02
2last month
1last week
Acq. date: 2026-01-05
Citations