Publication:

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Date

2021
Journal article
https://doi.org/10.1039/d1cp00065a
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Author(s)

Rathore, Ashish  
;
Cipriani, Maicol
;
Huang, Ching-Chung
;
Amiaud, Lionel
;
Dablemont, Celine
;
Lafosse, Anne
;
Ingolfsson, Oddur
;
De Simone, Danilo  
;
De Gendt, Stefan  

Journal

PHYSICAL CHEMISTRY CHEMICAL PHYSICS

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1350 since deposited on 2021-11-02
1last month
Acq. date: 2026-02-27

Citations