Publication:

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Date

2021
Journal article
https://doi.org/10.1039/d1cp00065a
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dc.contributor.authorRathore, Ashish
dc.contributor.authorCipriani, Maicol
dc.contributor.authorHuang, Ching-Chung
dc.contributor.authorAmiaud, Lionel
dc.contributor.authorDablemont, Celine
dc.contributor.authorLafosse, Anne
dc.contributor.authorIngolfsson, Oddur
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRathore, Ashish::0000-0003-3315-1588
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2023-01-19T12:36:05Z
dc.date.available2021-11-02T16:02:52Z
dc.date.available2023-01-19T12:36:05Z
dc.date.issued2021
dc.identifier.doi10.1039/d1cp00065a
dc.identifier.issn1463-9076
dc.identifier.pmidMEDLINE:33885061
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38012
dc.publisherROYAL SOC CHEMISTRY
dc.source.beginpage9228
dc.source.endpage9234
dc.source.issue15
dc.source.journalPHYSICAL CHEMISTRY CHEMICAL PHYSICS
dc.source.numberofpages7
dc.source.volume23
dc.title

Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

dc.typeJournal article
dspace.entity.typePublication
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