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Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
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Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
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Date
2021
Journal article
https://doi.org/10.1021/acsapm.1c00018
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rathore, Ashish
;
Pollentier, Ivan
;
Cipriani, Maicol
;
Singh, Harpreet
;
De Simone, Danilo
;
Ingolfsson, Oddur
;
De Gendt, Stefan
Journal
ACS APPLIED POLYMER MATERIALS
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1842
since deposited on 2022-03-01
Acq. date: 2025-12-17
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Views
1842
since deposited on 2022-03-01
Acq. date: 2025-12-17
Citations