Publication:

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

Date

2021
Journal article
https://doi.org/10.1021/acsapm.1c00018
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dc.contributor.authorRathore, Ashish
dc.contributor.authorPollentier, Ivan
dc.contributor.authorCipriani, Maicol
dc.contributor.authorSingh, Harpreet
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorIngolfsson, Oddur
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidextIngolfsson, Oddur::0000-0002-7100-9438
dc.contributor.orcidimecRathore, Ashish::0000-0003-3315-1588
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2022-03-01T15:36:52Z
dc.date.available2022-03-01T15:36:52Z
dc.date.issued2021
dc.identifier.doi10.1021/acsapm.1c00018
dc.identifier.issn2637-6105
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39194
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage1964
dc.source.endpage1972
dc.source.issue4
dc.source.journalACS APPLIED POLYMER MATERIALS
dc.source.numberofpages9
dc.source.volume3
dc.subject.keywordsRESIST MATERIALS
dc.subject.keywordsBILAYER RESIST
dc.subject.keywordsELECTRONS
dc.subject.keywordsDESIGN
dc.title

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

dc.typeJournal article
dspace.entity.typePublication
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