Browsing by Author "Ito, Satoru"
Now showing 1 - 2 of 2
- Results Per Page
- Sort Options
Publication Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Proceedings paper2007, Symposium on VLSI Technology. Digest of Technical Papers, 12/06/2007, p.200-201Publication Work-function engineering for 32nm node pMOS devices: high-performance TaCNO-gated films
Journal article2008, IEEE Electron Device Letters, (29) 11, p.1203-1205