Browsing by Author "Joshi, Abhijeet"
Now showing 1 - 3 of 3
- Results Per Page
- Sort Options
Publication Characterization of annealing and dopant activation processes using Differential Hall Effect Metrology (DHEM)
Proceedings paper2021, Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11, 30/05/2021, p.113Publication Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)
Proceedings paper2021-05, 239th ECS Meeting, 2021/05/3 - 2021/06/03Publication Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)
Meeting abstract2021-05, 239th ECS Meeting: G01: Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11, 2021/05/30 - 2021/06/03, p.1009