Browsing by Author "Kamohara, Itaru"
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Publication Experimental validation of rigorous, 3D profile models for negative-tone develop resists
;Gao, Weimin ;Klostermann, Ulrich ;Kamohara, Itaru ;Schmoeller, ThomasLucas, KevinProceedings paper2014, Optical Microlithography XXVIII, 23/02/2014, p.90520CPublication Experimental validation of stochastic modeling for negative-tone develop EUV resist
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.942223Publication Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithograpgy VIII, 26/02/2017, p.101430I