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Browsing by Author "Kamohara, Itaru"

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    Experimental validation of rigorous, 3D profile models for negative-tone develop resists

    Gao, Weimin
    ;
    Klostermann, Ulrich
    ;
    Kamohara, Itaru
    ;
    Schmoeller, Thomas
    ;
    Lucas, Kevin
    Proceedings paper
    2014, Optical Microlithography XXVIII, 23/02/2014, p.90520C
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    Experimental validation of stochastic modeling for negative-tone develop EUV resist

    Kamohara, Itaru
    ;
    Gao, Weimin  
    ;
    Klostermann, Ulrich
    ;
    Schmöller, Thomas
    ;
    Demmerle, Wolfgang
    Proceedings paper
    2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.942223
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    Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

    Gao, Weimin  
    ;
    Blanco, Victor  
    ;
    Philipsen, Vicky  
    ;
    Kamohara, Itaru
    ;
    Saad, Yves
    ;
    Ciofi, Ivan  
    Proceedings paper
    2017, Extreme Ultraviolet (EUV) Lithograpgy VIII, 26/02/2017, p.101430I

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