Browsing by Author "Kapteyn, Henry"
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Publication Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Oral presentation2021-02-22, SPIE Advanced Lithography 2021, Novel Patterning TechnologiesPublication Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Proceedings paper2021, SPIE Advanced Lithography Novel Patterning Technologies 2021, 22/02/2021