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Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Publication:
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Date
2021-02-22
Presentation
https://doi.org/10.1117/12.2595038
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Holzmeier, Fabian
;
Dorney, Kevin
;
Witting Larsen, Esben
;
Nuytten, Thomas
;
Singh, Dhirendra
;
van Setten, Michiel
;
Vanelderen, Pieter
;
Bargsten, Clayton
;
Cousin, Seth
;
Raymondson, Daisy
;
Rinard, Eric
;
Ward, Rod
;
Kapteyn, Henry
;
Bottcher, Stefan
;
Dyachenko, Oleksiy
;
Kremzow, Raimund
;
Wietstruk, Marko
;
Pourtois, Geoffrey
;
van der Heide, Paul
;
Petersen, John
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1231
since deposited on 2023-06-13
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Acq. date: 2025-11-01
Citations
Metrics
Views
1231
since deposited on 2023-06-13
1
last week
Acq. date: 2025-11-01
Citations