Publication:

Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

Date

2021-02-22
Presentation
https://doi.org/10.1117/12.2595038
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dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorDorney, Kevin
dc.contributor.authorWitting Larsen, Esben
dc.contributor.authorNuytten, Thomas
dc.contributor.authorSingh, Dhirendra
dc.contributor.authorvan Setten, Michiel
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorBargsten, Clayton
dc.contributor.authorCousin, Seth
dc.contributor.authorRaymondson, Daisy
dc.contributor.authorRinard, Eric
dc.contributor.authorWard, Rod
dc.contributor.authorKapteyn, Henry
dc.contributor.authorBottcher, Stefan
dc.contributor.authorDyachenko, Oleksiy
dc.contributor.authorKremzow, Raimund
dc.contributor.authorWietstruk, Marko
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorPetersen, John
dc.contributor.imecauthorHolzmeier, Fabian
dc.contributor.imecauthorDorney, Kevin
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorSingh, Dhirendra
dc.contributor.imecauthorvan Setten, Michiel
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorPetersen, John
dc.contributor.orcidimecHolzmeier, Fabian::0000-0001-8749-5330
dc.contributor.orcidimecDorney, Kevin::0000-0003-2097-6994
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecSingh, Dhirendra::0000-0002-8855-0597
dc.contributor.orcidimecvan Setten, Michiel::0000-0003-0557-5260
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.contributor.orcidimecPetersen, John::0000-0003-4815-3770
dc.date.accessioned2023-12-04T10:20:50Z
dc.date.available2023-06-13T20:51:05Z
dc.date.available2023-12-04T10:20:50Z
dc.date.issued2021-02-22
dc.identifier.doihttps://doi.org/10.1117/12.2595038
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41731
dc.source.conferenceSPIE Advanced Lithography 2021, Novel Patterning Technologies
dc.title

Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

dc.typeOral presentation
dspace.entity.typePublication
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