Browsing by Author "Kearney, Patrick"
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Publication Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94220IPublication Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 24/02/2014, p.90481OPublication Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography, 21/02/2016, p.977619