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Browsing by Author "Keldermans, Johan"

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    Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

    Le, Quoc Toan  
    ;
    Keldermans, Johan
    ;
    Chiodarelli, Nicolo
    ;
    Kesters, Els  
    ;
    Lux, Marcel  
    ;
    Claes, Martine  
    Journal article
    2008, Japanese Journal of Applied Physics, (47) 8, p.6870-6874
  • Loading...
    Thumbnail Image
    Publication

    Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

    Le, Quoc Toan  
    ;
    Keldermans, Johan
    ;
    Chiodarelli, Nicolo
    ;
    Kesters, Els  
    ;
    Lux, Marcel  
    ;
    Claes, Martine  
    Proceedings paper
    2007-11, International Symposium on Dry Process, 13/11/2007, p.37-38

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