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Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma
Publication:
Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma
Date
2007-11
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Keldermans, Johan
;
Chiodarelli, Nicolo
;
Kesters, Els
;
Lux, Marcel
;
Claes, Martine
;
Vereecke, Guy
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1909
since deposited on 2021-10-16
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Acq. date: 2025-12-08
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Views
1909
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-08
Citations