Browsing by Author "Kempsell, Monica"
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Publication AIMS TM 45 inspection of CH treated with inverse lithography
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
Proceedings paper2008, Photomask Technology 2008, 7/10/2008, p.71221EPublication Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Proceedings paper2009, Design for Manufacturability through Design-Process Integration III, 22/02/2009, p.72750XPublication Design split algorithms validation for DPT implementation at 32 nm and beyond
Publication Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.68240LPublication Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.43001