Publication:

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Date

2009

Journal article

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Files

20291.pdf 1.13 MB

Author(s)

Kempsell, Monica

;

Hendrickx, Eric

;

Tritchkov, Alexander

;

Sakajiri, Kyohei

;

;

Yoshitake, Susuki

;

;

Vandenberghe, Geert

;

Smith, Bruce W.

Journal

Journal of Micro/Nanolithography, MEMS, and MOEMS

Statistics

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Acq. date: 2026-01-26