Publication:

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Date

2009
Journal article
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dc.contributor.authorKempsell, Monica
dc.contributor.authorHendrickx, Eric
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorSakajiri, Kyohei
dc.contributor.authorYasui, Kenichi
dc.contributor.authorYoshitake, Susuki
dc.contributor.authorGranik, Yuri
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSmith, Bruce W.
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-17T23:23:29Z
dc.date.available2021-10-17T23:23:29Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15584
dc.source.beginpage43001
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume8
dc.title

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

dc.typeJournal article
dspace.entity.typePublication
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