Browsing by Author "Khaira, Gurdaman"
Now showing 1 - 4 of 4
- Results per page
- Sort Options
Publication Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 041603Publication Better prediction on patterning failure mode with hotspot aware OPC modeling
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXIV, 22/02/2021, p.1161112Publication Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Journal article review2022, JAPANESE JOURNAL OF APPLIED PHYSICS, (61) SD, p.SD0806Publication Calibration of Gaussian Random Field stochastic EUV models
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.1205105