Browsing by Author "Kim, Y."
Now showing 1 - 5 of 5
- Results Per Page
- Sort Options
Publication A systematic study of trade-offs in engineering a locally strained pMOSFET
Proceedings paper2004, Technical Digest International Electron Devices Meeting - IEDM, 13/12/2004, p.1055-1058Publication Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
;Young, C.D. ;Kerber, Andreas ;Hou, T.H. ;Cartier, Eduard ;Brown, G.A. ;Bersuker, G. ;Kim, Y.Lim, C.Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.347-359Publication Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
;Young, C.D. ;Kerber, Andreas ;Hou, T.H. ;Cartier, E. ;Brown, G.A. ;Bersuker, G. ;Kim, Y.Lim, C.Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 12/10/2003Publication Layout impact on the performance of a locally strained PMOSFET
Proceedings paper2005, Symposium on VLSI Technology. Digest of Technical Papers, 14/06/2005, p.22-23Publication Study of Ni-Silicide contacts to Si:C source/drain
Journal article2007, Semiconductor Fabtech, 34, p.92-98