Browsing by Author "Komori, Kana"
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Publication Cleaning the high aspect ratio STI structures for advanced logic devices by implementation of a surface modification drying technique
Meeting abstract2018, Ultra Clean Processing of Semiconductor Surfaces XIV - UCPSS, 2/09/2018, p.190-193Publication Dry removal of a surface functionalization chemistry used for pattern collapse prevention
Meeting abstract2018, Surface Preparation & Cleaning Conference - SPCC, 10/04/2018Publication Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
Meeting abstract2018-05, 9th International SiGe Technology and Device Meeting / 11th International Conference on Silicon Epitaxy and Heterostructures, 27/05/2018, p.193-194Publication SiGe vs. Si selective wet etchingfor Si gate-all-around
; ; ; Publication Study of SiGe cleaning
Proceedings paper2017, 232nd ECS Meeting: 15th International Symposium on Semiconductor Cleaning and Technology - SCST15, 1/10/2017, p.141-146