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Browsing by Author "Kosugi, Hitoshi"

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    EUV process sensitivities and optimizations for track processing

    Shite, Hideo
    ;
    Bradon, Neil
    ;
    Nafus, Kathleen  
    ;
    Kitano, Junichi
    ;
    Kosugi, Hitoshi
    ;
    Hermans, Jan  
    Proceedings paper
    2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010
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    EUV processing investigation on state-of-the-art coater/developer system

    Shite, Hideo
    ;
    Bradon, Neil
    ;
    Shimoaoki, T.
    ;
    Kobayashi, S.
    ;
    Nafus, Kathleen  
    ;
    Kosugi, Hitoshi
    Proceedings paper
    2011, Extreme Ultravoiolet (EUV) Lithography II, 27/02/2011, p.796937
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    Track processing optimizations for different EUV resist platforms: preparing for a 3300 baseline process

    Foubert, Philippe  
    ;
    Matsunaga, Koichi
    ;
    Shite, Hideo
    ;
    Shimoaoki, Takeshi
    ;
    Nafus, Kathleen  
    Proceedings paper
    2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792T

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