Browsing by Author "Kwakman, Laurens"
Now showing 1 - 4 of 4
- Results Per Page
- Sort Options
Publication Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices
;Johanesen, Hayley ;Strauss, Michael ;Kenslea, Anne ;Hakala, ChrisKwakman, LaurensProceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/12/2019, p.109591CPublication Statistical significance of STEM based metrology on advanced 3D transistor structures
Proceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590CPublication Surface contamination and electrical damage by focused ion beam: conditions applicable to the extraction of TEM lamellae from nano-electronic devices
Journal article2015, Semiconductor Science and Technology, (30) 11, p.114015Publication Surface redeposition and damage due to focused ion beam milling
Oral presentation2015, ESREF European FIB Users Group Workshop - EFUB