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Browsing by Author "Kwakman, Laurens"

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    Evaluation of the accuracy and precision of STEM and EDS metrology on horizontal GAA nanowire devices

    Johanesen, Hayley
    ;
    Strauss, Michael
    ;
    Kenslea, Anne
    ;
    Hakala, Chris
    ;
    Kwakman, Laurens
    Proceedings paper
    2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/12/2019, p.109591C
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    Statistical significance of STEM based metrology on advanced 3D transistor structures

    Kwakman, Laurens
    ;
    Kenslea, Anne
    ;
    Johanesen, Hayley
    ;
    Strauss, Michael
    ;
    Boullart, Werner  
    Proceedings paper
    2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590C
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    Surface contamination and electrical damage by focused ion beam: conditions applicable to the extraction of TEM lamellae from nano-electronic devices

    Bender, Hugo  
    ;
    Franquet, Alexis  
    ;
    Drijbooms, Chris  
    ;
    Parmentier, Brigitte  
    ;
    Clarysse, Trudo
    Journal article
    2015, Semiconductor Science and Technology, (30) 11, p.114015
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    Surface redeposition and damage due to focused ion beam milling

    Bender, Hugo  
    ;
    Franquet, Alexis  
    ;
    Drijbooms, Chris  
    ;
    Parmentier, Brigitte  
    ;
    Vandervorst, Wilfried  
    Oral presentation
    2015, ESREF European FIB Users Group Workshop - EFUB

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