Browsing by Author "Lamantia, Matthew"
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Publication Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.73791LPublication Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM
Publication EUV mask defectivity: status and mitigation towards HVM
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.73790RPublication Investigation of mask defect density in full field EUV lithography
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009