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Investigation of mask defect density in full field EUV lithography
Publication:
Investigation of mask defect density in full field EUV lithography
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Date
2009
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Van Den Heuvel, Dieter
;
Lamantia, Matthew
;
Hermans, Jan
;
Hendrickx, Eric
;
Goethals, Mieke
;
Vandenberghe, Geert
;
Ronse, Kurt
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1932
since deposited on 2021-10-17
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last month
Acq. date: 2025-12-12
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Metrics
Views
1932
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-12
Citations