Browsing by Author "Lecordier, Laurent"
Now showing 1 - 5 of 5
- Results per page
- Sort Options
Publication Applications of smart monomolecular films in IC microelectronics for organic-inorganic interface engineering
Meeting abstract2017, 43rd International Conference on Micro and Nanoengineering - MNE, 18/09/2017Publication Developing a full wafer-scale approach towards high ALD selectivity on copper vs low-K (and oxides) using a single ALD/SAMS platform
Meeting abstract2017, AVS 17th International Conference on Atomic Layer Deposition - ALD, 15/07/2017Publication Novel method to achieve area selective ALD on copper metal vs. SiO2using vapor-phase deposited SAMS
;Lecordier, LaurentMeeting abstract2016, 16th International Atomic Layer Deposition Conference - ALD, 24/07/2016Publication Vapor phase thiol self-assembled monolayers for ALD blocking
Meeting abstract2018, Materials for Advanced Metallization Conference - MAM 2018, 18/03/2018, p.03SALDPublication Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry
Journal article2018, Journal of Vacuum Science and Technology A, (36) 3, p.31605