Browsing by Author "Lewellen, John"

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Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Lucas, Kevin
;
Cork, Christopher M.
;
Miloslavsky, Alexander
;
Luk-Pat, Gerard
;
Barnes, Levi D.
Journal article
2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 3, p.33002
Interactions of double patterning technology with wafer processing, OPC and design flows

Lucas, Kevin
;
Cork, Chris
;
Miloslavsky, Alex
;
Luk-Pat, Gerry
;
Barnes, Levi
;
Hapli, John
Proceedings paper
2008, Optical Microlithography XXI, 24/02/2008, p.692403