Browsing by Author "Li, Li"
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Publication Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.355-358Publication Improvement and evaluation of drying techniques for HF-last wafer cleaning
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.167-170Publication Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
Journal article1996, Journal of the Electrochemical Society, (143) 1, p.233-237Publication New drying techology for advanced cleaning in IC manufacturing
Proceedings paper1994, Vacuum and Semiconductor Processing Conference, 15/06/1994Publication Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
Journal article1995, Journal of Applied Physics, (77) 3, p.1323-5Publication UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
Proceedings paper1994, Proceedings 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.163-166