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Browsing by Author "Li, Wei-Min"

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    Materials characterization of WNxCy, WNx and WCx films for advanced barriers

    Volders, Henny  
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    Tokei, Zsolt  
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    Bender, Hugo  
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    Brijs, Bert
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    Caluwaerts, Rudy  
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    Carbonell, Laure
    Journal article
    2007, Microelectronic Engineering, (84) 11, p.2441-2465
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    Opportunities and challenges for integration of ALD barrier layers in damascene process flows

    Sprey, Hessel  
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    Schuhmacher, Jorg
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    Travaly, Youssef
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    Sutcliffe, Victor
    ;
    Abell, Thomas
    Proceedings paper
    2004, Atomic Layer Deposition Conference, 16/08/2004
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    Thin film characterization of PEALD Ru layers on an ALD WNC substrate

    Volders, Henny  
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    Tokei, Zsolt  
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    Sinapi, Fabrice
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    Bender, Hugo  
    ;
    Benedetti, Alessandro
    ;
    Brijs, Bert
    Proceedings paper
    2007, Advanced Metallization Conference 2006 - AMC 2006, 17/10/2006, p.227-232

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