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Browsing by Author "Lindner, J."

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    Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric

    Van Elshocht, Sven  
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    Weber, U.
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    Conard, Thierry  
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    Kaushik, Vidya
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    Houssa, Michel  
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    Hyun, Sangjin
    Journal article
    2005, Journal of the Electrochemical Society, (152) 11, p.F185-F189
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    Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodes

    Weber, U.
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    Boissière, O.
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    Lindner, J.
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    Schuhmacher, M.
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    Lehnen, Peer
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    Manke, C.
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    Van Elshocht, Sven  
    Proceedings paper
    2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.293
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    Selective epitaxial growth of III-V semiconductor heterostructures on Si substrates for logic appliation

    Nguyen, Duy
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    Wang, Gang
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    Brammertz, Guy  
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    Leys, Maarten
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    Waldron, Niamh  
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    Winderickx, Gillis  
    Proceedings paper
    2010-10, SiGe, Ge, and Related Compounds 4: Materials, Processing and Devices, 11/10/2010, p.933-939
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    Selective epitaxial growth of III-V semiconductor heterostructures on Si substrates for logic applications

    Nguyen, Duy
    ;
    Wang, Gang
    ;
    Waldron, Niamh  
    ;
    Winderickx, Gillis  
    ;
    Brammertz, Guy  
    ;
    Leys, Maarten
    Meeting abstract
    2010-10, 218th Electrochemical Society Meeting: SiGe, Ge & Related Compounds: Materials, Processing, and Devices Symposium, 10/10/2010, p.1952

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