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Browsing by Author "Liu, H.Y."

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    Complementary phase-shift mask towards 70-nm technology node

    Driessen, Frank
    ;
    Vandenberghe, Geert  
    ;
    Ercken, Monique  
    ;
    Montgomery, Patrick
    ;
    Ronse, Kurt  
    Proceedings paper
    2002, Optical Microlithography XV, 5/03/2002, p.Addendum
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    Extending ArF to the 65-nm node with full-phase lithography

    Driessen, Frank
    ;
    Pierrat, C.
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    Vandenberghe, Geert  
    ;
    Ronse, Kurt  
    ;
    Van Adrichem, Paul  
    ;
    Liu, H.Y.
    Proceedings paper
    2003, Optical Microlithography XVI, 23/02/2003, p.1091-1102
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    Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.764008

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