imec Institutional Repository Browsing {{ collection }} by Author "Liu, Hua-Yu"

Publication

Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node

Driessen, Frank

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Liu, Hua-Yu

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Karklin, Linard

Proceedings paper

2002, Optical Microlithography XV, 5/03/2002, p.1180-1189

Publication

OPC resist model separability validation after SMO source change

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Proceedings paper

2013, Optical Microlithography XXVI, 24/02/2013, p.86831B

Publication

Separable models for computational lithography

Liu, Hua-Yu

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Zhao, Q.

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Chen, J.F.

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Jiang, J.

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Socha, B.

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Van Setten, E.

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Engelen, A.

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Meessen, J.

Proceedings paper

2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70280X

Browsing by Author "Liu, Hua-Yu"