Browsing by Author "Lucas, K."
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Publication 100nm generation contact patterning by low temperature 193nm resist reflow process
Journal article2002, Semiconductor Fabtech, 16, p.?-?Publication Line-edge roughness reduction and CD slimming using hardback processing
Proceedings paper2003, Metrology, Inspection, and Process Control for Microlithography XVII, 24/02/2003, p.1131-1142Publication Resist reflow for 193-nm low-K1 lithography contacts
Proceedings paper2003, Advances in Resist Technology an Processing XX, 23/02/2003, p.807-816