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Browsing by Author "Magana, John"

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    Additional evidence of EUV blank defects first seen by wafer printing

    Jonckheere, Rik  
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    Van Den Heuvel, Dieter  
    ;
    Hendrickx, Eric  
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    Ronse, Kurt  
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    Bret, Tristan
    Proceedings paper
    2011, Photomask Technology 2011, 19/09/2011, p.81660E
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    Comparison between existing inspection techniques for EUV mask defects

    Van Den Heuvel, Dieter  
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    Jonckheere, Rik  
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    Hendrickx, Eric  
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    Cheng, Shaunee
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    Ronse, Kurt  
    Proceedings paper
    2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010
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    EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy

    Bret, Tristan
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    Baralia, Gabriel
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    Baur, Christof
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    Budach, Michael
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    Hofmann, Thorsten
    Oral presentation
    2011, 55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN
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    Evidence of printing blank-related defects on EUV masks missed by blank inspection

    Jonckheere, Rik  
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    Van Den Heuvel, Dieter  
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    Hendrickx, Eric  
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    Ronse, Kurt  
    ;
    Bret, Tristan
    Proceedings paper
    2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850W
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    Natural EUV mask blank defects: evidence, timely detection, analysis and outlook

    Van Den Heuvel, Dieter  
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    Jonckheere, Rik  
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    Magana, John
    ;
    Abe, Tsukasa
    ;
    Bret, Tristan
    Proceedings paper
    2010, Photomask Technology 2010, 13/09/2010, p.78231T

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