Browsing by Author "Magana, John"
Now showing 1 - 5 of 5
- Results Per Page
- Sort Options
Publication Additional evidence of EUV blank defects first seen by wafer printing
Proceedings paper2011, Photomask Technology 2011, 19/09/2011, p.81660EPublication Comparison between existing inspection techniques for EUV mask defects
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
;Bret, Tristan ;Baralia, Gabriel ;Baur, Christof ;Budach, MichaelHofmann, ThorstenOral presentation2011, 55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication Evidence of printing blank-related defects on EUV masks missed by blank inspection
Proceedings paper2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850WPublication Natural EUV mask blank defects: evidence, timely detection, analysis and outlook
Proceedings paper2010, Photomask Technology 2010, 13/09/2010, p.78231T