Browsing by Author "Maloney, Chris"
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Publication Feasibility of compensating for EUV field edge effects through OPC
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.90480TPublication Mitigating mask roughness via pupil filtering
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90521OPublication Pattern fidelity verification for logic design in EUV lithography
Proceedings paper2014, Extreme Ultraviolet (EUV) Llithography V, 23/02/2014, p.90480VPublication The impact of pupil plane filtering on mask roughness transfer
Journal article2013, Journal of Vacuum Science and Technology B, (31) 6, p.06F801