Browsing by Author "Martin, Patrick"
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Publication Heated implantation with amorphous carbon CMOS mask for scaled FinFETs
Proceedings paper2013, Symposium on VLSI Technology - VLSIT, 10/06/2013, p.196-197Publication Impact of AAPSM etch depth linearity in ArF immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs
Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.542-545Publication Mask blank stress birefringence requirements for hyper-NA lithography
Proceedings paper2005, 193 Immersion Symposium, 12/09/2005Publication The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
;Geh, Bernd ;Flagello, Donis ;Progler, Chris ;Martin, Patrick ;Leunissen, PeterHansen, SteveProceedings paper2005, 25th Annual BACUS Symposium on Photomask Technology, 3/10/2005, p.599210Publication Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Proceedings paper2005, Photomask and Next-Generation Lithography Mask Technology XII, 13/04/2005, p.211-222