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Browsing by Author "Martin, Patrick"

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    Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

    Togo, Mitsuhiro
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    Sasaki, Yuichiro
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    Zschaetzsch, Gerd
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    Boccardi, Guillaume  
    Proceedings paper
    2013, Symposium on VLSI Technology - VLSIT, 10/06/2013, p.196-197
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    Impact of AAPSM etch depth linearity in ArF immersion lithography

    Cangemi, Michael
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    Philipsen, Vicky  
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    Leunissen, Peter
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    De Ruyter, Rudi  
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    Jonckheere, Rik  
    Proceedings paper
    2005, 2nd International Symposium on Immersion Lithography, 12/09/2005
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    Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs

    Sasaki, Yuichiro
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    Godet, Ludovic
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    Chiarella, Thomas  
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    Brunco, David
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    Rockwell, Tyler
    ;
    Lee, Jae Woo
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.542-545
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    Mask blank stress birefringence requirements for hyper-NA lithography

    Leunissen, Peter
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    Philipsen, Vicky  
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    De Ruyter, Rudi  
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    Demarteau, M.
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    van de Kerkhof, M.
    Proceedings paper
    2005, 193 Immersion Symposium, 12/09/2005
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    The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging

    Geh, Bernd
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    Flagello, Donis
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    Progler, Chris
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    Martin, Patrick
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    Leunissen, Peter
    ;
    Hansen, Steve
    Proceedings paper
    2005, 25th Annual BACUS Symposium on Photomask Technology, 3/10/2005, p.599210
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    Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

    Philipsen, Vicky  
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    Leunissen, Peter
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    De Ruyter, Rudi  
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    Jonckheere, Rik  
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    Martin, Patrick
    Proceedings paper
    2005, Photomask and Next-Generation Lithography Mask Technology XII, 13/04/2005, p.211-222

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