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Browsing by Author "Maslow, M."

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    Extending EUV lithography for DRAM applications

    Rispens, Gijsbert  
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    Van Lare, C.
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    Oorschot, D.
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    Hoefnagels, R.
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    Liu, S.
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    Van Mierlo, W.
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    Zuurbier, N.
    Proceedings paper
    2020, Extreme Ultraviolet (EUV) Lithography XI, 20/02/2020, p.113230U
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    SPM characterizaton of anomalies in phase shift mask and their effect on wafer features

    Muckenhirn, S.
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    Meyyappan, A.
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    Walch, K.
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    Maslow, M.
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    Vandenberghe, Geert  
    Proceedings paper
    2001, Metrology, Inspection, and Process Control for Microlithography XV, 26/02/2001, p.188-199
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    Tone reversal patterning for advanced technology nodes

    Schleicher, Filip  
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    Bekaert, Joost  
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    Thiam, Arame  
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    Decoster, Stefan  
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    Blanc, Romuald  
    Proceedings paper
    2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.1205605

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