Publication:

Tone reversal patterning for advanced technology nodes

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2610941
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Published version 2.67 MB

Author(s)

Schleicher, Filip  
;
Bekaert, Joost  
;
Thiam, Arame  
;
Decoster, Stefan  
;
Blanc, Romuald  
;
Lazzarino, Frederic  
;
Santaclara, J. Garcia
;
Rispens, G.
;
Maslow, M.

Journal

Proceedings of SPIE

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233 since deposited on 2022-09-08
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