Publication:

Tone reversal patterning for advanced technology nodes

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2610941
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dc.contributor.authorSchleicher, Filip
dc.contributor.authorBekaert, Joost
dc.contributor.authorThiam, Arame
dc.contributor.authorDecoster, Stefan
dc.contributor.authorBlanc, Romuald
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorSantaclara, J. Garcia
dc.contributor.authorRispens, G.
dc.contributor.authorMaslow, M.
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorBlanc, Romuald
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2022-11-25T09:09:00Z
dc.date.available2022-09-08T02:38:40Z
dc.date.available2022-11-25T09:09:00Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2610941
dc.identifier.eisbn978-1-5106-4988-0
dc.identifier.isbn978-1-5106-4987-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40372
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1205605
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2020-2022
dc.source.conferencelocationna
dc.source.journalProceedings of SPIE
dc.source.numberofpages13
dc.source.volume12056
dc.title

Tone reversal patterning for advanced technology nodes

dc.typeProceedings paper
dspace.entity.typePublication
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