Browsing by Author "Matsubayashi, Daisuke"
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Publication Accurate off-current evaluation by parasitic capacitance extraction in capacitor-less DRAM cells
Proceedings paper2025, IEEE International Memory Workshop (IMW), 2025-05-18, p.13-16Publication Band Tail State Broadening in IGZO TFTs After pBTI-Induced Negative VT Shift Revealed via DC and 1/f Noise Measurements
Journal article2026, IEEE ELECTRON DEVICE LETTERS, (47) 5, p.929-932Publication First Systematic Characterization of Floating Body Effects in GAA Nanosheet 3D DRAM Access Transistors
Proceedings paper2025, IEEE International Electron Devices Meeting (IEDM), 2025-12-06Publication First-principles screening for sustainable OTS materials
Journal article2024, SOLID-STATE ELECTRONICS, (214) April, p.Art. 108876Publication Improving IGZO transistor PBTI reliability with hydrogen anneal achieving overdrive voltage of 1.2V for a lifetime of 5 years at 95°C
Proceedings paper2025, IEEE International Electron Devices Meeting (IEDM), 2025-12-06Publication In silico screening for As/Se-free ovonic threshold switching materials
Journal article2023, NPJ COMPUTATIONAL MATERIALS, (9) 1, p.Art. 96Publication In-Poor IGZO: Superior Resilience to Hydrogen in Forming Gas Anneal and PBTI
Journal article2025, ACS APPLIED ELECTRONIC MATERIALS, (7) 9, p.4210-4219Publication OTS Physics-based Screening for Environment-friendly Selector Materials
Proceedings paper2022, International Electron Devices Meeting (IEDM), DEC 03-07, 2022Publication Pathways for Retention Boost in Atomic Layer Etched IGZO-Based Capacitorless DRAM
Journal article2025, IEEE ELECTRON DEVICE LETTERS, (46) 7, p.1111-1114Publication The Impact of Process Steps on Nearly Ideal Subthreshold Slope in 300-mm Compatible InGaZnO TFTs
Journal article2025, IEEE ELECTRON DEVICE LETTERS, (46) 5, p.761-764Publication Understanding the Cycling-Dependent Threshold Voltage Instability in OTS Devices
Proceedings paper2022, International Electron Devices Meeting (IEDM), DEC 03-07, 2022Publication Unraveling BTI in IGZO devices: impact of device architecture, channel film deposition method and stoichiometry/phase, and device operating conditions
Proceedings paper2024, IEEE International Electron Devices Meeting (IEDM), 2024-12-07