Browsing by Author "Mertens, S."
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Publication Advanced cleaning and ultra-thin oxide technology
; ; ; ; ;Knotter, D. M.Oral presentation1998, SCP Symposium; 23-24 April 1998; Boise, ID, USA.Publication Advances in understanding wet cleaning technology and the effect of metal contamination
; ;Bearda, Twan; ; ;Loewenstein, LeeMeeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1061Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Cost-effective cleaning for advanced Si-processing
; ;Bearda, Twan; ; ;Knotter, D. M.Loewenstein, LeeProceedings paper1998, Technical Digest International Electron Devices Meeting - IEDM, 6/12/1998, p.325-328Publication Developments in cleaning technology for critical layers
Oral presentation2000, Santa Clara Plastics Symposium on Cleaning Technology; May 2000Publication Impact of gate oxide nitridation process on 1/f noise in 0.18 micron CMOS
Journal article2001, Microelectronics Reliability, (41/42) 12, p.1933-1938Publication New technologies for reducing chemical costs and environmental impact
Proceedings paper1998, Technical Symposium SEMICON Europa: Environmentally Conscious Manufacturing - Can Environmental Action Also Save Money?, 1/04/1998Publication Transistor optimisation for a low-cost, high-performance 0.13 μm CMOS technology
Oral presentation2001, 2nd ULIS Workshop on Ultimate Integration of Silicon; 2001;